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High-k Gate Dielectrics for CMOS Technology

Autor
Herausgegeben von Gang He, Herausgegeben von Zhaoqi Sun

High-k Gate Dielectrics for CMOS Technology

Beschreibung

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technologicalviewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of thesematerials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sectionswith directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Verlag
Wiley-VCH
ISBN/EAN
978-3-527-64636-4
Preis
178,99 EUR
Status
lieferbar